Schematic of Punch-Out Method for Minimum-Mass Targets in Material Science

Schematic view of the punch-out method for minimum-mass targets. Target material is on the substrate film. Punch-out laser pulse irradiates the back surface of the transparent substrate. Tinfoil is ablated, creating tin plasma at the boundary. Remaining tinfoil is driven to high velocity by expanding plasma.

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Schematic view of the novel target supplement, called the punch-out method, to supply minimum-mass targets. 10 The target material is on the substrate film, at first. The punch-out laser (PoL) pulse is irradiated on the back surface of the transparent substrate film. The tin foil is ablated by the PoL pulse and produces a tin plasma at the boundary of the foil and substrate. The rest of the tinfoil (mass-limited) is driven to a high velocity due to the expanding plasma, Schematic view of the punch-out method for minimum-mass targets. Target material is on the substrate film. Punch-out laser pulse irradiates the back surface of the transparent substrate. Tinfoil is ablated, creating tin plasma at the boundary. Remaining tinfoil is driven to high velocity by expanding plasma

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